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US09356059B2 BSI image sensor chips and methods for forming the same 有权
BSI图像传感器芯片及其形成方法

BSI image sensor chips and methods for forming the same
Abstract:
A device includes semiconductor substrate having a front side and a backside. A polysilicon layer is disposed on the backside of the semiconductor substrate. The polysilicon layer includes a portion doped with a p-type impurity. A dielectric layer is disposed on the backside of the semiconductor substrate, wherein the polysilicon layer is between the semiconductor substrate and the polysilicon layer.
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