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US09349760B2 Method of manufacturing a TFT-LCD array substrate having light blocking layer on the surface treated semiconductor layer 有权
在表面处理的半导体层上制造具有遮光层的TFT-LCD阵列基板的方法

Method of manufacturing a TFT-LCD array substrate having light blocking layer on the surface treated semiconductor layer
Abstract:
A thin film transistor liquid crystal display (TFT-LCD) array substrate comprises a gate line, a data line, a pixel electrode and a thin film transistor. The pixel electrode and the thin film transistor are formed in a pixel region defined by intersecting of the gate line and the data line, and the thin film transistor comprises a gate electrode, a semiconductor layer, a source electrode and a drain electrode. Two separate parts of the surface of the semiconductor layer are treated by a surface treatment to form into an ohmic contact layer, and the source electrode and the drain electrode are connected with the semiconductor layer through the ohmic contact layer in the two separate parts, respectively.
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