Invention Grant
US09349616B2 Semiconductor device and method of forming WLCSP with semiconductor die embedded within interconnect structure 有权
半导体器件和半导体管芯嵌入互连结构中的WLCSP的形成方法

Semiconductor device and method of forming WLCSP with semiconductor die embedded within interconnect structure
Abstract:
A semiconductor device includes a semiconductor die. An encapsulant is deposited over the semiconductor die. An insulating layer is formed over the encapsulant and a first surface of the semiconductor die. A semiconductor component is disposed over the insulating layer and first surface of the semiconductor die. A first interconnect structure is formed over the encapsulant and first surface of the semiconductor die to embed the semiconductor component. A conductive via is formed in the semiconductor die. A heat sink is formed over the semiconductor die. A second interconnect structure is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the semiconductor component. An opening is formed in the insulating layer.
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