Invention Grant
US09316767B2 Method of manufacturing microlens array substrate, microlens array substrate, electro-optic device, and electronic 有权
微透镜阵列衬底,微透镜阵列衬底,电光器件和电子的制造方法

Method of manufacturing microlens array substrate, microlens array substrate, electro-optic device, and electronic
Abstract:
There is provided a method of manufacturing a microlens array substrate with improved manufacturing yield and high quality, the method including: forming a groove part along an outer edge of a first area on a surface of a substrate; forming a mask layer to cover a side of the surface, forming a plurality of openings in the first area, and forming openings along the outer edge of the first area; performing isotropic etching on the substrate through the mask layer, forming a plurality of recesses in the first area, and forming recesses across a boundary part between the first area and the groove part; removing the mask layer from the substrate; forming a light transmission material layer that has a refractive index, which is different from a refractive index of the substrate, to cover the side of the surface of the substrate and to bury the plurality of recesses; and planarizing an upper surface of the light transmission material layer.
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