发明授权
- 专利标题： Accommodating device for retaining wafers
- 专利标题（中）： 用于保留晶片的容纳装置
-
申请号： US13994183申请日： 2010-12-20
-
公开(公告)号： US09312161B2公开(公告)日： 2016-04-12
- 发明人: Markus Wimplinger , Thomas Wagenleitner , Alexander Filbert
- 申请人： Markus Wimplinger , Thomas Wagenleitner , Alexander Filbert
- 申请人地址： AT
- 专利权人： EV Group E. Thallner GmbH
- 当前专利权人： EV Group E. Thallner GmbH
- 当前专利权人地址： AT
- 代理机构： Kusner & Jaffe
- 国际申请： PCT/EP2010/007793 WO 20101220
- 国际公布： WO2012/083978 WO 20120628
- 主分类号： H01L21/68
- IPC分类号： H01L21/68 ; H01L21/683 ; H01L21/67 ; H01L21/66
摘要：
A receiving means for receiving and mounting of wafers. The receiving means includes a mounting surface. A mounting means is provided for mounting a wafer on the mounting surface. A compensation means is provided for active, especially locally controllable, at least partial compensation of local and/or global distortions of the wafer.
公开/授权文献
- US20130330165A1 ACCOMMODATING DEVICE FOR RETAINING WAFERS 公开/授权日：2013-12-12
信息查询
IPC分类:
