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US09310527B2 Antireflective film comprising large particle size fumed silica 有权
包含大粒度的热解法二氧化硅的抗反射膜

Antireflective film comprising large particle size fumed silica
Abstract:
Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the low refractive index layer increases in porosity from the light transmissive substrate interface to an opposing porous surface.
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