Invention Grant
- Patent Title: Antireflective film comprising large particle size fumed silica
- Patent Title (中): 包含大粒度的热解法二氧化硅的抗反射膜
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Application No.: US13976535Application Date: 2012-02-17
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Publication No.: US09310527B2Publication Date: 2016-04-12
- Inventor: Encai Hao , Jun-Ying Zhang , Robert F. Kamrath , Lan H. Liu , Ming Cheng , Jung-Sheng Wu , Mark J. Pellerite , Richard J. Pokorny , Suresh S. Iyer
- Applicant: Encai Hao , Jun-Ying Zhang , Robert F. Kamrath , Lan H. Liu , Ming Cheng , Jung-Sheng Wu , Mark J. Pellerite , Richard J. Pokorny , Suresh S. Iyer
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Carolyn A. Fischer
- International Application: PCT/US2012/025573 WO 20120217
- International Announcement: WO2012/121858 WO 20120913
- Main IPC: G02B1/111
- IPC: G02B1/111 ; B32B27/20 ; B32B27/30 ; B32B5/14

Abstract:
Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the low refractive index layer increases in porosity from the light transmissive substrate interface to an opposing porous surface.
Public/Granted literature
- US20140022644A1 ANTIREFLECTIVE FILM COMPRISING LARGE PARTICLE SIZE FUMED SILICA Public/Granted day:2014-01-23
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