Invention Grant
US09306110B2 Apparatus and methods for continuous flow synthesis of semiconductor nanowires
有权
用于连续流合成半导体纳米线的装置和方法
- Patent Title: Apparatus and methods for continuous flow synthesis of semiconductor nanowires
- Patent Title (中): 用于连续流合成半导体纳米线的装置和方法
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Application No.: US14446285Application Date: 2014-07-29
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Publication No.: US09306110B2Publication Date: 2016-04-05
- Inventor: Anthony C. Onicha , Louise E. Sinks , Stefanie L. Weber
- Applicant: US Nano LLC
- Applicant Address: US FL Sarasota
- Assignee: US Nano LLC
- Current Assignee: US Nano LLC
- Current Assignee Address: US FL Sarasota
- Agency: Whyte Hirschboeck Dudek S.C.
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/0352 ; H01L33/04 ; H01L31/18 ; B05C3/10

Abstract:
Apparatuses and methods for synthesizing nanoscale materials are provided, including semiconductor nanowires. Precursor solutions include mixed reagent precursor solutions of metal and chalcogenide precursors and a catalyst, where such solutions are liquid at room temperature. The precursor solutions are mixed by dividing a solution flow into multiple paths and converging the paths to form a uniform solution. A thermally controlled reactor receives the uniform solution to form semiconductor nanowires. Various electronic, optical, and sensory devices may employ the semiconductor nanowires described herein, for example.
Public/Granted literature
- US20150037926A1 Apparatus and Methods for Continuous Flow Synthesis of Semiconductor Nanowires Public/Granted day:2015-02-05
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