Invention Grant
- Patent Title: Single photomask high precision thin film resistor
- Patent Title (中): 单光掩模高精密薄膜电阻
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Application No.: US14046177Application Date: 2013-10-04
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Publication No.: US09305688B2Publication Date: 2016-04-05
- Inventor: PingHai Hao , Fuchao Wang , Duofeng Yue
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Jacqueline J. Garner; Frank D. Cimino
- Main IPC: H01C1/012
- IPC: H01C1/012 ; H01C17/06 ; H01L49/02 ; H01C7/00 ; H01C17/075

Abstract:
An integrated circuit contains a thin film resistor in which a body of the thin film resistor is disposed over a lower dielectric layer in a system of interconnects in the integrated circuit. Heads of the thin film resistor are disposed over electrodes which are interconnect elements in the lower dielectric layer, which provide electrical connections to a bottom surface of the thin film resistor. Top surfaces of the electrodes are substantially coplanar with a top surface of the lower dielectric layer. A top surface of the thin film resistor is free of electrical connections. An upper dielectric layer is disposed over the thin film resistor.
Public/Granted literature
- US20140184381A1 SINGLE PHOTOMASK HIGH PRECISION THIN FILM RESISTOR Public/Granted day:2014-07-03
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