发明授权
- 专利标题: Nitride semiconductor light-emitting device and method of manufacturing the same
- 专利标题(中): 氮化物半导体发光器件及其制造方法
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申请号: US14363254申请日: 2012-12-05
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公开(公告)号: US09293647B2公开(公告)日: 2016-03-22
- 发明人: Hiroyuki Kashihara , Narihito Okada , Kazuyuki Tadatomo , Haruhisa Takiguchi
- 申请人: Sharp Kabushiki Kaisha , Yamaguchi University
- 申请人地址: JP Osaka-Shi JP Yamaguchi-Shi
- 专利权人: SHARP KABUSHIKI KAISHA,YAMAGUCHI UNIVERSITY
- 当前专利权人: SHARP KABUSHIKI KAISHA,YAMAGUCHI UNIVERSITY
- 当前专利权人地址: JP Osaka-Shi JP Yamaguchi-Shi
- 代理机构: Morrison & Foerster LLP
- 优先权: JP2011-266822 20111206
- 国际申请: PCT/JP2012/081486 WO 20121205
- 国际公布: WO2013/084926 WO 20130613
- 主分类号: H01L33/06
- IPC分类号: H01L33/06 ; H01L33/32 ; H01L33/24 ; H01L33/00 ; H01L33/08
摘要:
A nitride semiconductor light-emitting device is formed of an n-type nitride semiconductor layer, a trigger layer, a V-pit expanding layer, a light-emitting layer, and a p-type nitride semiconductor layer provided in this order. The light-emitting layer has a V-pit formed therein. The trigger layer is made of a nitride semiconductor material having a lattice constant different from that of a material that forms an upper surface of the n-type nitride semiconductor layer. The V-pit expanding layer is made of a nitride semiconductor material having a lattice constant substantially identical to that of the material that forms the upper surface of the n-type nitride semiconductor layer, and the V-pit expanding layer has a thickness of 5 nm or more and 5000 nm or less.
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