Invention Grant
US09284245B2 Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
有权
用于硬掩模组合物和硬掩模组合物的单体，包括使用硬掩模组合物形成图案的单体和方法
- Patent Title: Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
- Patent Title (中): 用于硬掩模组合物和硬掩模组合物的单体，包括使用硬掩模组合物形成图案的单体和方法
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Application No.: US14083598Application Date: 2013-11-19
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Publication No.: US09284245B2Publication Date: 2016-03-15
- Inventor: Sung-Jae Lee , Hwan-Sung Cheon , Youn-Jin Cho , Chul-Ho Lee , Chung-Heon Lee
- Applicant: Sung-Jae Lee , Hwan-Sung Cheon , Youn-Jin Cho , Chul-Ho Lee , Chung-Heon Lee
- Applicant Address: KR Gumi-si, Kyeongsangbuk-do
- Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee: CHEIL INDUSTRIES, INC.
- Current Assignee Address: KR Gumi-si, Kyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0155330 20121227
- Main IPC: C07C43/23
- IPC: C07C43/23 ; G03F7/09 ; G03F7/20 ; C07C33/26 ; G03F7/075 ; G03F7/40
Abstract:
A monomer for a hardmask composition represented by the following Chemical Formula 1,
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