发明授权
US09256137B2 Exposure apparatus, liquid holding method, and device manufacturing method 有权
曝光装置,液体保持方法和装置制造方法

  • 专利标题: Exposure apparatus, liquid holding method, and device manufacturing method
  • 专利标题(中): 曝光装置,液体保持方法和装置制造方法
  • 申请号: US13593079
    申请日: 2012-08-23
  • 公开(公告)号: US09256137B2
    公开(公告)日: 2016-02-09
  • 发明人: Hiroyuki Nagasaka
  • 申请人: Hiroyuki Nagasaka
  • 申请人地址: JP Tokyo
  • 专利权人: NIKON CORPORATION
  • 当前专利权人: NIKON CORPORATION
  • 当前专利权人地址: JP Tokyo
  • 代理机构: Oliff PLC
  • 优先权: JP2012-153959 20120709
  • 主分类号: G03B27/52
  • IPC分类号: G03B27/52 G03F7/20
Exposure apparatus, liquid holding method, and device manufacturing method
摘要:
An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.
信息查询
0/0