Invention Grant
- Patent Title: High pressure high CO2 removal configurations and methods
- Patent Title (中): 高压高CO2去除配置和方法
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Application No.: US13496302Application Date: 2010-09-16
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Publication No.: US09248398B2Publication Date: 2016-02-02
- Inventor: John Mak
- Applicant: John Mak
- Applicant Address: US CA Aliso Viejo
- Assignee: Fluor Technologies Corporation
- Current Assignee: Fluor Technologies Corporation
- Current Assignee Address: US CA Aliso Viejo
- Agency: Fish & Tsang LLP
- International Application: PCT/US2010/049058 WO 20100916
- International Announcement: WO2011/034993 WO 20110324
- Main IPC: B01D53/14
- IPC: B01D53/14

Abstract:
CO2 is removed from high-pressure feed gas in configurations and methods according to the inventive subject matter by contacting feed gas with cooled semi-rich solvent to form a two-phase mixture that is flashed into the bottom section of an absorber. Rich solvent from the absorber is then reduced in pressure to generate refrigeration for the semi-rich solvent and lean solvent countercurrently contacts the partially treated feed gas in the absorber to produce the semi-rich solvent. Among other advantages, cooling of the feed gas and semi-rich solvent by the pressure reduced rich solvent heats the rich solvent to allow enhanced regeneration of the solvent, and external refrigeration and heating of the solvent can be entirely avoided.
Public/Granted literature
- US20120227441A1 HIGH PRESSURE HIGH CO2 REMOVAL CONFIGURATIONS AND METHODS Public/Granted day:2012-09-13
Information query
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