发明授权
US09223209B2 Sulfonamide-containing photoresist compositions and methods of use
有权
含磺酰胺的光致抗蚀剂组合物和使用方法
- 专利标题： Sulfonamide-containing photoresist compositions and methods of use
- 专利标题（中）： 含磺酰胺的光致抗蚀剂组合物和使用方法
-
申请号： US12709346申请日： 2010-02-19
-
公开(公告)号： US09223209B2公开(公告)日： 2015-12-29
- 发明人: Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人： Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人地址： US NY Armonk JP Tokyo
- 专利权人： International Business Machines Corporation,Central Glass Co., Ltd.
- 当前专利权人： International Business Machines Corporation,Central Glass Co., Ltd.
- 当前专利权人地址： US NY Armonk JP Tokyo
- 代理机构： CanaanLaw, P.C.
- 代理商 Karen Canaan
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/20 ; G03F7/004 ; G03F7/11 ; G03F7/32
摘要：
Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol-soluble photoresists for resist-on-resist applications. The sulfonamide-containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
公开/授权文献
信息查询
IPC分类:
