Invention Grant
- Patent Title: Mask for deposition and deposition apparatus including the same
- Patent Title (中): 包括其的沉积和沉积设备的掩模
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Application No.: US13735995Application Date: 2013-01-07
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Publication No.: US09221072B2Publication Date: 2015-12-29
- Inventor: Jungmin Lee , ChoongHo Lee
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Dislay Co., Ltd.
- Current Assignee: Samsung Dislay Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Christie, Parker & Hale, LLP
- Priority: KR10-2012-0006349 20120119
- Main IPC: B05C21/00
- IPC: B05C21/00 ; H01L21/02 ; C23C14/04

Abstract:
A mask for deposition includes a deposition material passing portion including at least one opening column having a plurality of openings arranged in a first direction, and a frame portion adjacent the deposition material passing portion, wherein each of the openings is defined by a first slope and a second slope facing each other along the first direction and inclining toward one side of the frame portion respectively, and a third slope and a fourth slope facing each other along a second direction crossing the first direction, and wherein an inclined angle of the first slope of one of the openings at a central area of one of the opening columns is different from an inclined angle of the first slope of an other one of the openings at an outer area of the opening column.
Public/Granted literature
- US20130186330A1 MASK FOR DEPOSITION AND DEPOSITION APPARATUS INCLUDING THE SAME Public/Granted day:2013-07-25
Information query