Invention Grant
US09221072B2 Mask for deposition and deposition apparatus including the same 有权
包括其的沉积和沉积设备的掩模

Mask for deposition and deposition apparatus including the same
Abstract:
A mask for deposition includes a deposition material passing portion including at least one opening column having a plurality of openings arranged in a first direction, and a frame portion adjacent the deposition material passing portion, wherein each of the openings is defined by a first slope and a second slope facing each other along the first direction and inclining toward one side of the frame portion respectively, and a third slope and a fourth slope facing each other along a second direction crossing the first direction, and wherein an inclined angle of the first slope of one of the openings at a central area of one of the opening columns is different from an inclined angle of the first slope of an other one of the openings at an outer area of the opening column.
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