Invention Grant
- Patent Title: Imaging device and method for manufacturing same
- Patent Title (中): 成像装置及其制造方法
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Application No.: US14201985Application Date: 2014-03-10
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Publication No.: US09219175B2Publication Date: 2015-12-22
- Inventor: Hiroyuki Fukumizu , Takaaki Minami , Kentaro Eda , Takeshi Yosho
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-134280 20130626
- Main IPC: H01L31/0232
- IPC: H01L31/0232 ; H01L31/18

Abstract:
According to one embodiment, an imaging device includes a semiconductor layer, an electrode, first and second insulating films, and a light blocking film. The semiconductor layer has a first surface and a second surface on an opposite side to the first surface, and includes pixels configured to detect light. The electrode is provided on the first surface and is configured to control an output of the pixels. The first insulating film is provided on the second surface. The second insulating film is provided on the first insulating film and has a smaller refractive index in a visible light range than the first insulating film. One end of the light blocking film is located in the second insulating film or at a same level as a surface of the second insulating film. Another end of the light blocking film is located in the semiconductor layer.
Public/Granted literature
- US20150001660A1 IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-01-01
Information query
IPC分类: