Invention Grant
- Patent Title: Magnetic head manufacturing method forming sensor side wall film by over-etching magnetic shield
- Patent Title (中): 磁头制造方法通过过蚀刻磁屏蔽形成传感器侧壁膜
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Application No.: US14549428Application Date: 2014-11-20
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Publication No.: US09196268B2Publication Date: 2015-11-24
- Inventor: Hitoshi Iwasaki , Masayuki Takagishi
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2012-069974 20120326
- Main IPC: G11B5/39
- IPC: G11B5/39 ; G11B5/11 ; G01R33/09

Abstract:
According to one embodiment, a magnetic head includes a reproducing unit to detect a medium magnetic field recorded in a magnetic recording medium. The reproducing unit includes first and second magnetic shields, a stacked body, and a side wall film. The stacked body is provided between the first and second magnetic shields and includes first and second magnetic layer and an intermediate layer provided between them. The stacked body has a side wall. The side wall intersects a plane perpendicular to a stacking direction from the first magnetic shield toward the second magnetic shield. The side wall film covers at least a part of the side wall of the stacked body. The side wall film includes at least one of Fe and Co, and has a composition different from a composition of the first magnetic layer and different from a composition of the second magnetic layer.
Public/Granted literature
- US20150144592A1 METHOD FOR MANUFACTURING MAGNETIC HEAD Public/Granted day:2015-05-28
Information query
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