发明授权
US09178099B2 Methods for forming optoelectronic devices including heterojunction
有权
用于形成包括异质结的光电器件的方法
- 专利标题: Methods for forming optoelectronic devices including heterojunction
- 专利标题(中): 用于形成包括异质结的光电器件的方法
-
申请号: US13451439申请日: 2012-04-19
-
公开(公告)号: US09178099B2公开(公告)日: 2015-11-03
- 发明人: Hui Nie , Brendan M. Kayes , Isik C. Kizilyalli
- 申请人: Hui Nie , Brendan M. Kayes , Isik C. Kizilyalli
- 申请人地址: US CA Sunnyvale
- 专利权人: ALTA DEVICES, INC.
- 当前专利权人: ALTA DEVICES, INC.
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Sawyer Law Group, P.C.
- 主分类号: H01L31/0304
- IPC分类号: H01L31/0304 ; H01L31/0735 ; H01L31/0224 ; H01L31/18
摘要:
Embodiments generally relate to optoelectronic semiconductor devices such as photovoltaic cells. In one aspect, a method for forming a device includes forming an absorber layer made of gallium arsenide (GaAs) and having one type of doping, and forming an emitter layer made of a different material and having a higher bandgap than the absorber layer. An intermediate layer can be formed between emitter and absorber layers. A heterojunction and p-n junction are formed between the emitter layer and the absorber layer, where the p-n junction is formed at least partially within the different material at a location offset from the heterojunction. A majority of the absorber layer can be outside of a depletion region formed by the p-n junction. The p-n junction causes a voltage to be generated in the cell in response to the cell being exposed to light at a front side.
公开/授权文献
信息查询
IPC分类: