Invention Grant
- Patent Title: Offset printing process using light controlled wettability
- Patent Title (中): 胶版印刷工艺采用光控润湿性
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Application No.: US12510672Application Date: 2009-07-28
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Publication No.: US09126450B2Publication Date: 2015-09-08
- Inventor: Elton T. Ray , Thomas Robson
- Applicant: Elton T. Ray , Thomas Robson
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: Marylou J. Lavoie, Esq. LLC
- Main IPC: B41M1/06
- IPC: B41M1/06 ; G03B27/42 ; B41M7/00

Abstract:
A lithographic printing method including exposing an imaging surface layer of a printing plate to a first expose source to render the surface layer uniformly hydrophilic; the surface layer comprising a compound having reversible light controlled wettability whereby the surface layer is reversibly hydrophilic and hydrophobic. The surface layer is disposed over a variable image portion of the printing plate imaging surface or disposed over substantially all of the printing plate imaging surface. The surface is exposed to a second expose source to render image areas of the surface layer hydrophobic. Polar liquid attracts to non-image hydrophilic areas. Hydrophobic liquid colorant attracts to hydrophobic image areas. The surface layer is contacted an offset receiving member and the image is transferred to an image receiving substrate.
Public/Granted literature
- US20110023740A1 Offset Printing Process Using Light Controlled Wettability Public/Granted day:2011-02-03
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