Invention Grant
- Patent Title: Automated polishing systems and methods
- Patent Title (中): 自动抛光系统和方法
-
Application No.: US13693253Application Date: 2012-12-04
-
Publication No.: US09089949B2Publication Date: 2015-07-28
- Inventor: Mark Lawrence Hunt
- Applicant: General Electric Company
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agent Blake A. Nickles; Ernest G. Cusick; Frank A. Landgraff
- Main IPC: B24B49/16
- IPC: B24B49/16 ; B24B19/14 ; B24B51/00
Abstract:
Automated polishing systems include a polisher for polishing the coating on the article and a robotic positioner for moving the polisher relative to the article on an automated path, wherein the polisher polishes at least a part of the coating during movement, a force feedback sensor for determining a force of the polisher against the article during polishing, and a controller for maintaining the polisher within a predetermined force range against the article based at least in part on the force determined by the force feedback sensor.
Public/Granted literature
- US20140154954A1 AUTOMATED POLISHING SYSTEMS AND METHODS Public/Granted day:2014-06-05
Information query
