Invention Grant
US09085140B2 Active cliche for large-area printing, manufacturing method of the same, and printing method using the same
有权
主要用于大面积印刷,其制造方法相同,印刷方法使用相同
- Patent Title: Active cliche for large-area printing, manufacturing method of the same, and printing method using the same
- Patent Title (中): 主要用于大面积印刷,其制造方法相同,印刷方法使用相同
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Application No.: US13966336Application Date: 2013-08-14
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Publication No.: US09085140B2Publication Date: 2015-07-21
- Inventor: Yong Suk Yang , In-Kyu You , Soon-Won Jung , Bock Soon Na , Seok-Hwan Moon
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2012-0098469 20120905; KR10-2013-0031979 20130326
- Main IPC: B41J2/15
- IPC: B41J2/15 ; B41J2/14 ; B41J2/16 ; B41J2/06

Abstract:
Provided are a large-area nano-scale active printing device, a fabricating method of the same, and a printing method using the same. The printing device may include a substrate, first interconnection lines extending along a first direction, on the substrate, an interlayered dielectric layer provided on the first interconnection lines to have holes partially exposing the first interconnection lines, second interconnection lines provided adjacent to the holes in the interlayered dielectric layer to cross the first interconnection lines, and wedge-shaped electrodes provided at intersections with the first and second interconnection lines and connected to the first interconnection lines. The wedge-shaped electrodes protrude upward at centers of the holes.
Public/Granted literature
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