Invention Grant
- Patent Title: Methods of etching carbon nanotube sheet material for electrical circuit and thin film thermal structure applications
- Patent Title (中): 蚀刻用于电路和薄膜热结构应用的碳纳米管片材的方法
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Application No.: US13838606Application Date: 2013-03-15
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Publication No.: US09074295B2Publication Date: 2015-07-07
- Inventor: James R. Chow , Carl W. Townsend
- Applicant: Raytheon Company
- Applicant Address: US MA Waltham
- Assignee: RAYTHEON COMPANY
- Current Assignee: RAYTHEON COMPANY
- Current Assignee Address: US MA Waltham
- Agency: Daly, Crowley, Mofford & Durkee, LLP
- Main IPC: C25F3/14
- IPC: C25F3/14 ; C01B31/02 ; B82Y10/00 ; B82Y40/00 ; H01L21/3213
Abstract:
A method for etching Carbon Nanotube (CNT) sheet material for electrical circuit and thin film thermal structures. The method includes: forming an mask on a sheet of electrically conductive CNT material; and electrochemically removing unmasked portions of the CNT material.
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