发明授权
US09059003B2 Power semiconductor device, method of manufacturing the device and bonding wire
有权
功率半导体器件,器件的制造方法和接合线
- 专利标题: Power semiconductor device, method of manufacturing the device and bonding wire
- 专利标题(中): 功率半导体器件,器件的制造方法和接合线
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申请号: US14364555申请日: 2013-02-22
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公开(公告)号: US09059003B2公开(公告)日: 2015-06-16
- 发明人: Kohei Tatsumi , Takashi Yamada , Daizo Oda
- 申请人: NIPPON MICROMETAL CORPORATION , WASEDA UNIVERSITY
- 申请人地址: JP Iruma-Shi JP Tokyo
- 专利权人: NIPPON MICROMETAL CORPORATION,WASEDA UNIVERSITY
- 当前专利权人: NIPPON MICROMETAL CORPORATION,WASEDA UNIVERSITY
- 当前专利权人地址: JP Iruma-Shi JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2012-040116 20120227
- 国际申请: PCT/JP2013/054524 WO 20130222
- 国际公布: WO2013/129253 WO 20130906
- 主分类号: H01L23/00
- IPC分类号: H01L23/00
摘要:
It is an object of the present invention to provide a power semiconductor device, which is capable of being operable regardless of thermal stress generation, reducing a heat generation from wire, securing the reliability of bonding portion when the device is used for dealing with a large amount current and/or under a high temperature atmosphere, a method of manufacturing the device and a bonding wire. In a power semiconductor device in which a metal electrode (die electrode 3) on a power semiconductor die 2 and another metal electrode (connection electrode 4) are connected by metal wire 5 using wedge bonding connection, the metal wire is Ag or Ag alloy wire of which diameter is greater than 50 μm and not greater than 2 mm and the die 3 has thereon one or more metal and/or alloy layers, each of the layer(s) being 50 Å or more in thickness and a metal for the layer is selected from Ni, Cr, Cu, Pd, V, Ti, Pt, Zn, Ag, Au, W and Al.
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