发明授权
- 专利标题: Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
- 专利标题(中): 正型感光性树脂组合物,使用其制备的感光性树脂膜和包含感光性树脂膜的半导体装置
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申请号: US13603522申请日: 2012-09-05
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公开(公告)号: US09040213B2公开(公告)日: 2015-05-26
- 发明人: Hyun-Yong Cho , Sang-Soo Kim , Eun-Kyung Yoon , Jong-Hwa Lee , Jun-Ho Lee , Eun-Ha Hwang , Ji-Yun Kwon , Jin-Young Lee
- 申请人: Hyun-Yong Cho , Sang-Soo Kim , Eun-Kyung Yoon , Jong-Hwa Lee , Jun-Ho Lee , Eun-Ha Hwang , Ji-Yun Kwon , Jin-Young Lee
- 申请人地址: KR Gumi-si
- 专利权人: Cheil Industries Inc.
- 当前专利权人: Cheil Industries Inc.
- 当前专利权人地址: KR Gumi-si
- 代理机构: Additon, Higgins & Pendleton, P.A.
- 优先权: KR10-2011-0141439 20111223
- 主分类号: G03F7/023
- IPC分类号: G03F7/023
摘要:
Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
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