发明授权
- 专利标题: Lightwave circuit and method for manufacturing same
- 专利标题(中): 光波电路及其制造方法
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申请号: US14007085申请日: 2011-11-21
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公开(公告)号: US09031373B2公开(公告)日: 2015-05-12
- 发明人: Seo Young Lee , Hyung Jong Lee
- 申请人: Seo Young Lee , Hyung Jong Lee
- 申请人地址: KR Subuk-Myeon
- 专利权人: Seo Young Lee
- 当前专利权人: Seo Young Lee
- 当前专利权人地址: KR Subuk-Myeon
- 代理机构: The Webb Law Firm
- 优先权: KR10-2011-0026838 20110325
- 国际申请: PCT/KR2011/008886 WO 20111121
- 国际公布: WO2012/134025 WO 20121004
- 主分类号: G02B6/10
- IPC分类号: G02B6/10 ; G02B6/26 ; G02B6/125 ; G02B6/136
摘要:
Provided are a lightwave circuit and a method of manufacturing the same. The lightwave circuit includes a first substrate having an engraved core formation groove which is formed on an upper portion of the first substrate, a core layer which is formed inside the engraved core formation groove, a BPSG bonding layer which is formed on the first substrate including the core layer, and a second substrate which is formed on the BPSG bonding layer. Accordingly, light loss and branching uniformity of the lightwave circuit are effectively improved, and the lightwave circuit is manufactured simply and inexpensively while also further improving light loss and branching uniformity of the lightwave circuit.
公开/授权文献
- US20140023320A1 Lightwave Circuit and Method for Manufacturing Same 公开/授权日:2014-01-23
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