发明授权
- 专利标题: Conductive film manufacturing method, conductive film, and recording medium
- 专利标题(中): 导电膜制造方法,导电膜和记录介质
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申请号: US13638541申请日: 2011-03-28
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公开(公告)号: US09031310B2公开(公告)日: 2015-05-12
- 发明人: Takashi Wakui , Hideyasu Ishibashi , Osamu Shimazaki
- 申请人: Takashi Wakui , Hideyasu Ishibashi , Osamu Shimazaki
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2010-084645 20100331; JP2010-084647 20100331
- 国际申请: PCT/JP2011/057582 WO 20110328
- 国际公布: WO2011/125597 WO 20111013
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; H05K9/00
摘要:
Disclosed is a method for manufacturing a conductive film in which a mesh pattern comprising a wire material is provided on a base material. Also disclosed are a conductive film and a recording medium. Image data representing a mesh pattern is created on the basis of a plurality of selected positions. On the basis of said image data, an evaluation value which quantifies noise characteristics of the mesh pattern is computed. On the basis of the computed evaluation value and prescribed evaluation conditions, one image datum is chosen as an output image datum.
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