Invention Grant
- Patent Title: Mg discontinuous insertion layer for improving MTJ shunt
- Patent Title (中): Mg不连续插入层,用于改善MTJ分流
-
Application No.: US13739016Application Date: 2013-01-11
-
Publication No.: US08981505B2Publication Date: 2015-03-17
- Inventor: Takahiro Moriyama , Yu-Jen Wang , Ru-Ying Tong
- Applicant: Headway Technologies, Inc.
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L21/8246 ; H01L43/02 ; H01L43/12 ; G11C11/16

Abstract:
A MTJ is disclosed with a discontinuous Mg or Mg alloy layer having a thickness from 1 to 3 Angstroms between a free layer and a capping layer in a bottom spin valve configuration. It is believed the discontinuous Mg layer serves to block conductive material in the capping layer from diffusing through the free layer and into the tunnel barrier layer thereby preventing the formation of conductive channels that function as electrical shunts within the insulation matrix of the tunnel barrier. As a result, the “low tail” percentage in a plot of magnetoresistive ratio vs Rp is minimized which means the number of high performance MTJ elements in a MTJ array is significantly increased, especially when a high temperature anneal is included in the MTJ fabrication process. The discontinuous layer is formed by a low power physical vapor deposition process.
Public/Granted literature
- US20140197504A1 Mg Discontinuous Insertion Layer for Improving MTJ Shunt Public/Granted day:2014-07-17
Information query
IPC分类: