发明授权
US08977990B2 Exposure monitoring key to determine misalignment between blind and reticle
有权
曝光监测键确定盲区与掩模版之间的偏差
- 专利标题： Exposure monitoring key to determine misalignment between blind and reticle
- 专利标题（中）： 曝光监测键确定盲区与掩模版之间的偏差
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申请号： US13856164申请日： 2013-04-03
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公开(公告)号： US08977990B2公开(公告)日： 2015-03-10
- 发明人: Young-Sik An
- 申请人： Samsung Display Co., Ltd.
- 申请人地址： KR Giheung-Gu, Yongin, Gyeonggi-Do
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR Giheung-Gu, Yongin, Gyeonggi-Do
- 代理商 Robert E. Bushnell, Esq.
- 优先权： KR10-2012-0152504 20121224
- 主分类号： G06F17/50
- IPC分类号： G06F17/50 ; G03F1/22
摘要：
A reticle including exposure monitoring keys. The reticle includes an exposure region that is to be exposed to light during an exposure process, and a non-exposure region surrounding the exposure region and not to be exposed to the light. The exposure monitoring keys are disposed across a boundary between the exposure region and the non-exposure region.
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