发明授权
- 专利标题: Solid-state imaging device and manufacturing method of solid-state imaging device
- 专利标题(中): 固态成像装置及固态成像装置的制造方法
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申请号: US13601165申请日: 2012-08-31
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公开(公告)号: US08963267B2公开(公告)日: 2015-02-24
- 发明人: Koichi Kokubun , Yusaku Konno
- 申请人: Koichi Kokubun , Yusaku Konno
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2011-227773 20111017
- 主分类号: H01L31/0232
- IPC分类号: H01L31/0232 ; H01L31/18 ; H01L31/0216 ; H01L27/146
摘要:
According to one embodiment, there is provided a solid-state imaging device including a first photoelectric conversion layer and a color filter. The color filter includes a multi-layer interference filter and a guided mode resonant grating. The guided mode resonant grating includes a plurality of diffraction gratings and a plurality of inter-grating regions. The plurality of diffraction gratings are formed of a material having a first index of refraction and periodically arrayed at least one-dimensionally. The plurality of inter-grating regions are arranged between at least the plurality of diffraction gratings. Each of the plurality of inter-grating regions includes an insulating film region and an air gap region. The insulating film region is formed of a material having a second index of refraction lower than the first index of refraction.
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