发明授权
- 专利标题: Electrode of electrostatic lens and method of manufacturing the same
- 专利标题(中): 静电透镜电极及其制造方法
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申请号: US13862728申请日: 2013-04-15
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公开(公告)号: US08963099B2公开(公告)日: 2015-02-24
- 发明人: Shuji Yamada
- 申请人: Canon Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2012-113097 20120517
- 主分类号: H01J1/02
- IPC分类号: H01J1/02 ; H01J3/18 ; H01J37/317 ; H01J9/02 ; H01J37/12 ; H01J1/46 ; H01J3/02 ; H01J9/14
摘要:
An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.
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