发明授权
US08962365B2 Method of manufacturing GaN-based film and composite substrate used therefor
有权
制造用于其的GaN基膜和复合基板的方法
- 专利标题: Method of manufacturing GaN-based film and composite substrate used therefor
- 专利标题(中): 制造用于其的GaN基膜和复合基板的方法
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申请号: US13696873申请日: 2011-12-21
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公开(公告)号: US08962365B2公开(公告)日: 2015-02-24
- 发明人: Issei Satoh , Yuki Seki , Koji Uematsu , Yoshiyuki Yamamoto , Hideki Matsubara , Shinsuke Fujiwara , Masashi Yoshimura
- 申请人: Issei Satoh , Yuki Seki , Koji Uematsu , Yoshiyuki Yamamoto , Hideki Matsubara , Shinsuke Fujiwara , Masashi Yoshimura
- 申请人地址: JP Osaka-shi, Osaka
- 专利权人: Sumitomo Electric Industies, Ltd.
- 当前专利权人: Sumitomo Electric Industies, Ltd.
- 当前专利权人地址: JP Osaka-shi, Osaka
- 代理机构: Drinker Biddle & Reath LLP
- 优先权: JP2011-222998 20111007
- 国际申请: PCT/JP2011/079636 WO 20111221
- 国际公布: WO2013/051163 WO 20130411
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L21/02 ; C30B23/02 ; C30B25/18 ; C30B29/40
摘要:
The present method of manufacturing a GaN-based film includes the steps of preparing a composite substrate including a support substrate dissoluble in hydrofluoric acid and a single crystal film arranged on a side of a main surface of the support substrate, a coefficient of thermal expansion in the main surface of the support substrate being more than 0.8 time and less than 1.2 times as high as a coefficient of thermal expansion of GaN crystal, forming a GaN-based film on a main surface of the single crystal film arranged on the side of the main surface of the support substrate, and removing the support substrate by dissolving the support substrate in hydrofluoric acid. Thus, the method of manufacturing a GaN-based film capable of efficiently obtaining a GaN-based film having a large main surface area, less warpage, and good crystallinity, as well as a composite substrate used therefor are provided.
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