Invention Grant
- Patent Title: Fault injection of finFET devices
- Patent Title (中): finFET器件的故障注入
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Application No.: US13864725Application Date: 2013-04-17
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Publication No.: US08959468B2Publication Date: 2015-02-17
- Inventor: Atul Katoch , Saman M. I. Adham , Cormac Michael O'Connell
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
Defect-describing (or “cut”) layer(s) for describing defects associated with different sides of a 3-dimensional (3D) structure enable fault modeling to determine the effect of position and location of defects on transistor performance. One or more defect-describing layers are used to identify the coordinates and sides of the 3D structures of the defects. The defect-describing layer(s) enables fault-modeling for 3D structures to understand the effects of faults on different locations, especially for defects associated with the fins of the finFET devices. Faults are injected to different locations and sides of fins and are modeled with different test vectors, test parameters and testing devices to identify detectable faults. The fault modeling would help identify the sources of defects and also improve layout design of finFET device structures.
Public/Granted literature
- US20140282332A1 FAULT INJECTION OF FINFET DEVICES Public/Granted day:2014-09-18
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