发明授权
- 专利标题: Nitride semiconductor light emitting device and method of manufacturing the same
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申请号: US13787136申请日: 2013-03-06
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公开(公告)号: US08932943B2公开(公告)日: 2015-01-13
- 发明人: Joo Young Cheon , Yu Ri Sohn
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-Si, Gyeonggi-Do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-Si, Gyeonggi-Do
- 代理机构: F. Chau & Associates, LLC
- 优先权: KR10-2012-0023264 20120307
- 主分类号: H01L21/36
- IPC分类号: H01L21/36
摘要:
A method of manufacturing a nitride semiconductor light emitting device which includes forming an n-type semiconductor layer, forming an active layer on the n-type semiconductor layer, forming a superlattice layer by alternately stacking at least two nitride layers made of InxAlyGa(1-x-y)N (0≦x≦1, 0≦y≦1, and 0≦x+y≦1) having different energy bandgaps from each other and doped with a p-type dopant, and forming a p-type semiconductor layer on the superlattice layer. The forming of the superlattice layer is performed by adjusting a flow rate of a p-type dopant source gas to reduce the flow rate in a growth termination period of the superlattice layer by no greater than about half of the flow rate in a growth initiation period of the superlattice layer while being doped with the p-type dopant.
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