发明授权
US08927189B2 Photoresist composition and method of manufacturing display device using same
有权
光刻胶组合物及使用其的显示装置的制造方法
- 专利标题： Photoresist composition and method of manufacturing display device using same
- 专利标题（中）： 光刻胶组合物及使用其的显示装置的制造方法
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申请号： US13961458申请日： 2013-08-07
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公开(公告)号： US08927189B2公开(公告)日： 2015-01-06
- 发明人: Gwui-Hyun Park , Pil Soon Hong , Jinho Ju , Taegyun Kim , Jin-Su Byun , Dong Min Kim , Seung Ki Kim , Doo Youn Lee
- 申请人： Samsung Display Co., Ltd.
- 申请人地址： KR
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Cantor Colburn LLP
- 优先权： KR10-2013-0021421 20130227
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; G03F7/30 ; H01L21/312 ; G03F7/008 ; G03F7/20
摘要：
A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.
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