发明授权
US08921019B2 Positive photosensitive resin composition, and photosensitive resin layer and display device using the same
有权
正性感光性树脂组合物和感光性树脂层及使用其的显示装置
- 专利标题: Positive photosensitive resin composition, and photosensitive resin layer and display device using the same
- 专利标题(中): 正性感光性树脂组合物和感光性树脂层及使用其的显示装置
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申请号: US13603479申请日: 2012-09-05
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公开(公告)号: US08921019B2公开(公告)日: 2014-12-30
- 发明人: Ji-Yun Kwon , Jin-Hee Kang , Dae-Yun Kim , Sang-Kyeon Kim , Sang-Kyun Kim , Sang-Soo Kim , Kun-Bae Noh , Eun-Kyung Yoon , Jong-Hwa Lee , Jun-Ho Lee , Jin-Young Lee , Hwan-Sung Cheon , Hyun-Yong Cho , Chung-Beom Hong , Eun-Ha Hwang
- 申请人: Ji-Yun Kwon , Jin-Hee Kang , Dae-Yun Kim , Sang-Kyeon Kim , Sang-Kyun Kim , Sang-Soo Kim , Kun-Bae Noh , Eun-Kyung Yoon , Jong-Hwa Lee , Jun-Ho Lee , Jin-Young Lee , Hwan-Sung Cheon , Hyun-Yong Cho , Chung-Beom Hong , Eun-Ha Hwang
- 申请人地址: KR Gumi-si
- 专利权人: Cheil Industries Inc.
- 当前专利权人: Cheil Industries Inc.
- 当前专利权人地址: KR Gumi-si
- 代理机构: Additon, Higgins & Pendleton, P.A.
- 优先权: KR10-2011-0147388 20111230
- 主分类号: G03F7/023
- IPC分类号: G03F7/023
摘要:
Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
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