发明授权
US08902402B2 Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
有权
移动体装置，曝光装置，曝光方法以及装置的制造方法
- 专利标题： Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
- 专利标题（中）： 移动体装置，曝光装置，曝光方法以及装置的制造方法
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申请号： US12640636申请日： 2009-12-17
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公开(公告)号： US08902402B2公开(公告)日： 2014-12-02
- 发明人: Yuichi Shibazaki
- 申请人： Yuichi Shibazaki
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2009-122416 20090520
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03F7/20
摘要：
In an exposure station, positional information of a stage holding a wafer is measured by a first fine movement stage position measurement system including a measurement arm, and in a measurement station, positional information of a stage holding a wafer is measured by a second fine movement stage position measurement system including another measurement arm. An exposure apparatus has a third fine movement stage position measurement system which can measure positional information of a stage when the stage is carried from the measurement station to the exposure station. The third fine movement stage measurement system includes an encoder system including a plurality of Y heads and a laser interferometer system including a laser interferometer.
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