Invention Grant
- Patent Title: Manufacturing method for sulfonic acid group-containing ether compound
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Application No.: US14304382Application Date: 2014-06-13
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Publication No.: US08877962B2Publication Date: 2014-11-04
- Inventor: Masato Nakano , Akihiko Kanzaki , Takahiro Tsumori
- Applicant: Nippon Shokubai Co, Ltd
- Applicant Address: JP Osaka
- Assignee: Nippon Shokubai Co, Ltd
- Current Assignee: Nippon Shokubai Co, Ltd
- Current Assignee Address: JP Osaka
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: JP2008-234243 20080912
- Main IPC: C07C309/00
- IPC: C07C309/00 ; C07C309/20

Abstract:
The present invention provides a method for efficiently producing a sulfonic acid group-containing ether compound having a high purity and a good polymerizability while preventing production of a byproduct, and provides a sulfonic acid group-containing ether compound containing fewer impurities and having a good radical (co)polymerizability.The present invention provides a method of producing a sulfonic acid group-containing ether compound by reacting a sulfurous acid compound with a compound represented by the formula (1): wherein R1 represents a single bond, a CH2 group, or a CH2CH2 group, and R2 represents H, or a CH3 group, the method comprising the steps of: adjusting pH of a reaction system to 5.5 or greater with use of an alkaline substance; and adding the compound represented by the formula (1) to a reaction vessel containing the sulfurous acid compound.
Public/Granted literature
- US20140296565A1 MANUFACTURING METHOD FOR SULFONIC ACID GROUP-CONTAINING ETHER COMPOUND Public/Granted day:2014-10-02
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