- 专利标题: Manufacturing method for sulfonic acid group-containing ether compound
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申请号: US14304382申请日: 2014-06-13
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公开(公告)号: US08877962B2公开(公告)日: 2014-11-04
- 发明人: Masato Nakano , Akihiko Kanzaki , Takahiro Tsumori
- 申请人: Nippon Shokubai Co, Ltd
- 申请人地址: JP Osaka
- 专利权人: Nippon Shokubai Co, Ltd
- 当前专利权人: Nippon Shokubai Co, Ltd
- 当前专利权人地址: JP Osaka
- 代理机构: Novak Druce Connolly Bove + Quigg LLP
- 优先权: JP2008-234243 20080912
- 主分类号: C07C309/00
- IPC分类号: C07C309/00 ; C07C309/20
摘要:
The present invention provides a method for efficiently producing a sulfonic acid group-containing ether compound having a high purity and a good polymerizability while preventing production of a byproduct, and provides a sulfonic acid group-containing ether compound containing fewer impurities and having a good radical (co)polymerizability.The present invention provides a method of producing a sulfonic acid group-containing ether compound by reacting a sulfurous acid compound with a compound represented by the formula (1): wherein R1 represents a single bond, a CH2 group, or a CH2CH2 group, and R2 represents H, or a CH3 group, the method comprising the steps of: adjusting pH of a reaction system to 5.5 or greater with use of an alkaline substance; and adding the compound represented by the formula (1) to a reaction vessel containing the sulfurous acid compound.
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