发明授权
- 专利标题： Method of making superoleophobic re-entrant resist structures
- 专利标题（中）： 制备超疏油反渗透抗蚀剂结构的方法
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申请号： US13550169申请日： 2012-07-16
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公开(公告)号： US08870345B2公开(公告)日： 2014-10-28
- 发明人: Yuanjia Zhang , Kyoo-Chul Park , Hong Zhao , Kock-Yee Law
- 申请人： Yuanjia Zhang , Kyoo-Chul Park , Hong Zhao , Kock-Yee Law
- 申请人地址： US CT Norwalk
- 专利权人： Xerox Corporation
- 当前专利权人： Xerox Corporation
- 当前专利权人地址： US CT Norwalk
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： B41J29/393
- IPC分类号： B41J29/393
摘要：
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
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