发明授权
US08870345B2 Method of making superoleophobic re-entrant resist structures 有权
制备超疏油反渗透抗蚀剂结构的方法

Method of making superoleophobic re-entrant resist structures
摘要:
A device and method for preparing a device having a superoleophobic surface are disclosed. The method includes providing a substrate; coating a lift-off resist layer on the substrate; baking the lift-off resist layer; layering a photoresist layer on the lift-off resist layer; performing photolithography to create a textured pattern in the photoresist layer and the lift-off resist layer, and chemically modifying the textured pattern to create a superoleophobic surface.
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