发明授权
- 专利标题： Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate
- 专利标题（中）： 检测方法和装置，光刻设备，光刻处理单元和用于确定基板性质的器件制造方法
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申请号： US13123613申请日： 2009-10-22
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公开(公告)号： US08848195B2公开(公告)日： 2014-09-30
- 发明人: Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
- 申请人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 国际申请： PCT/EP2009/063918 WO 20091022
- 国际公布： WO2010/049348 WO 20100506
- 主分类号： G01N21/47
- IPC分类号： G01N21/47 ; G03F7/20
摘要：
In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
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