发明授权
US08808961B2 Composition, resist film, pattern forming method, and inkjet recording method
有权
组合物，抗蚀剂膜，图案形成方法和喷墨记录方法
- 专利标题： Composition, resist film, pattern forming method, and inkjet recording method
- 专利标题（中）： 组合物，抗蚀剂膜，图案形成方法和喷墨记录方法
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申请号： US12914762申请日： 2010-10-28
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公开(公告)号： US08808961B2公开(公告)日： 2014-08-19
- 发明人: Tomotaka Tsuchimura , Takeshi Kawabata , Takayuki Ito
- 申请人： Tomotaka Tsuchimura , Takeshi Kawabata , Takayuki Ito
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2009-250886 20091030
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; C07C311/48 ; C07C311/51 ; C07C233/00 ; B41J2/01 ; C07D317/14 ; G03F7/038 ; C07D405/12 ; C07D317/72 ; G03F7/039 ; G03F7/004 ; C07D317/58 ; C07D319/06 ; G03F7/20
摘要：
An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated.
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