发明授权
- 专利标题: Method of manufacturing high resolution organic thin film pattern
- 专利标题(中): 制造高分辨率有机薄膜图案的方法
-
申请号: US12979260申请日: 2010-12-27
-
公开(公告)号: US08778600B2公开(公告)日: 2014-07-15
- 发明人: Min-Chul Suh , Sin-Doo Lee , Won-Suk Choi , Min-Hoi Kim
- 申请人: Min-Chul Suh , Sin-Doo Lee , Won-Suk Choi , Min-Hoi Kim
- 申请人地址: KR Yongin, Gyeonggi-Do KR Seoul
- 专利权人: Samsung Display Co., Ltd.,SNU R&DB Foundation
- 当前专利权人: Samsung Display Co., Ltd.,SNU R&DB Foundation
- 当前专利权人地址: KR Yongin, Gyeonggi-Do KR Seoul
- 代理机构: Knobbe, Martens, Olson & Bear, LLP
- 优先权: KR10-2010-0002377 20100111
- 主分类号: G03F7/26
- IPC分类号: G03F7/26
摘要:
A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern.
公开/授权文献
信息查询
IPC分类: