Invention Grant
US08750037B2 Non-volatile memory utilizing impact ionization and tunnelling and method of manufacturing thereof 有权
利用冲击电离和隧穿的非易失性存储器及其制造方法

Non-volatile memory utilizing impact ionization and tunnelling and method of manufacturing thereof
Abstract:
A non-volatile memory device (and method of manufacture) is disclosed and structured to enable a write operation using an ionization impact process in a first portion of the device and a read operation using a tunneling process in a second portion of the device. The non-volatile memory device (1) increases hot carrier injection efficiency, (2) decreases power consumption, and (3) enables voltage and device scaling in the non-volatile memory devices.
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