Invention Grant
US08741540B2 Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern
有权
硬掩模组合物，形成图案的方法和包括图案的半导体集成电路器件
- Patent Title: Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern
- Patent Title (中): 硬掩模组合物，形成图案的方法和包括图案的半导体集成电路器件
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Application No.: US13241389Application Date: 2011-09-23
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Publication No.: US08741540B2Publication Date: 2014-06-03
- Inventor: Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
- Applicant: Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
- Applicant Address: KR Gumi-Si, Kyeongsangbuk-Do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-Si, Kyeongsangbuk-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0139422 20101230
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/11 ; G03F7/40
Abstract:
A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2:
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