Invention Grant
- Patent Title: Substrate for liquid discharge head and liquid discharge head
- Patent Title (中): 液体排放头和排液头基板
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Application No.: US13898332Application Date: 2013-05-20
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Publication No.: US08721048B2Publication Date: 2014-05-13
- Inventor: Takeru Yasuda , Takuya Hatsui , Makoto Sakurai , Soichiro Nagamochi , Souta Takeuchi , Yuzuru Ishida , Kazuaki Shibata
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc., IP Division
- Priority: JP2012-116935 20120522; JP2013-089846 20130422
- Main IPC: B41J2/05
- IPC: B41J2/05

Abstract:
The reduction in reliably of a liquid discharge head due to the dissolution of a protective layer is suppressed. A substrate for a liquid discharge head includes a base substrate, a heat-generating resistive layer placed on the base substrate, a pair of lines placed on the base substrate, and a protective layer covering the heat-generating resistive layer and the lines. The protective layer contains a material represented by the formula SixCyNx, where x+y+z=100, 30≦x≦59, y≧5, and z≧15 on an atomic percent basis.
Public/Granted literature
- US20130314474A1 SUBSTRATE FOR LIQUID DISCHARGE HEAD AND LIQUID DISCHARGE HEAD Public/Granted day:2013-11-28
Information query
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