发明授权
- 专利标题: Compensation of back pattern effect in a memory device
- 专利标题(中): 在存储器件中补偿背面图案效果
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申请号: US13790393申请日: 2013-03-08
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公开(公告)号: US08717815B2公开(公告)日: 2014-05-06
- 发明人: Tommaso Vali , Violente Moschiano , Giovanni Santin
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 代理机构: Leffert Jay & Polglaze, P.A.
- 优先权: ITRM2007A0621 20071128
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C16/04 ; G11C29/00
摘要:
In one or more of the disclosed embodiments, a read operation is compensated for back pattern effect. A bit line current is generated by a read operation that biases the word lines. As part of a back pattern effect measurement phase, at predetermined time intervals an indication of the discharge status of the bit line is stored in a latch of a set of N latches coupled to each bit line. At the end of the measurement phase, the set of latches contains a multiple bit word that is an indication of the back pattern effect experienced by that particular series string of memory cells. This back pattern effect indication is used in subsequent read operations to adjust the timing of the operation.
公开/授权文献
- US20130188427A1 COMPENSATION OF BACK PATTERN EFFECT IN A MEMORY DEVICE 公开/授权日:2013-07-25
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