发明授权
US08710710B2 Method of fabricating crystal unit, crystal unit fabrication mask, and crystal unit package
有权
制造晶体单元，晶体单元制造掩模和晶体单元封装的方法
- 专利标题： Method of fabricating crystal unit, crystal unit fabrication mask, and crystal unit package
- 专利标题（中）： 制造晶体单元，晶体单元制造掩模和晶体单元封装的方法
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申请号： US13137630申请日： 2011-08-30
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公开(公告)号： US08710710B2公开(公告)日： 2014-04-29
- 发明人: Hajime Kubota , Masayuki Itoh , Masakazu Kishi
- 申请人： Hajime Kubota , Masayuki Itoh , Masakazu Kishi
- 申请人地址： JP Kawasaki
- 专利权人： Fujitsu Limited
- 当前专利权人： Fujitsu Limited
- 当前专利权人地址： JP Kawasaki
- 代理机构： Staas & Halsey LLP
- 优先权： JP2010-204054 20100913
- 主分类号： H01L41/08
- IPC分类号： H01L41/08
摘要：
A method of fabricating a crystal unit fills an adhesive from a first opening in a front surface of a mask of each of penetration holes in the mask in a state in which the mask is set on a base, into each penetration hole, and heats, by a heating element, a sidewall region defining a second opening in a back surface of the mask, in order to cure a sidewall part of the adhesive in the sidewall region defining each penetration hole in contact with the adhesive filling each penetration hole. A crystal blank is bonded on the base using the adhesive in order to form the crystal unit, after removing the mask from the base.
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