发明授权
US08697317B2 Exposure apparatus for forming a reticle and method of forming a reticle using the same
有权
用于形成掩模版的曝光装置和使用其形成掩模版的方法
- 专利标题： Exposure apparatus for forming a reticle and method of forming a reticle using the same
- 专利标题（中）： 用于形成掩模版的曝光装置和使用其形成掩模版的方法
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申请号： US13564196申请日： 2012-08-01
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公开(公告)号： US08697317B2公开(公告)日： 2014-04-15
- 发明人: Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
- 申请人： Jin Choi , Jin-Ha Jeong , Urazaev Vladimir , Hea-Yun Lee
- 申请人地址： KR Suwon-si, Gyeonggi-do
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si, Gyeonggi-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2011-0085039 20110825
- 主分类号： G03F1/20
- IPC分类号： G03F1/20
摘要：
A method including loading a blank reticle; projecting an electron beam; moving a second aperture plate having a first and second pattern aperture so the first pattern aperture is overlapped by a first aperture of a first aperture plate, the electron beam passing through the first pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam that passes the first pattern aperture to form a first exposure pattern; moving the second aperture plate so the second pattern aperture is overlapped by the first aperture of the first aperture plate, the electron beam passing through the second pattern aperture after passing the first aperture; exposing the blank reticle with the electron beam after passing the second pattern aperture, to form a second exposure pattern; and developing the blank reticle having the first and second exposure patterns to form the reticle having first and second patterns.
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