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US08691706B2 Reducing substrate warpage in semiconductor processing 有权
降低半导体加工中的基板翘曲

Reducing substrate warpage in semiconductor processing
Abstract:
System and method for reducing substrate warpage in a thermal process. An embodiment comprises pre-heating a substrate in a loadlock chamber before performing the thermal process of the substrate. After the thermal process, the substrate is cooled down in a loadlock chamber. The pre-heat and cool-down process reduces the warpage of the substrate caused by the differences in coefficients of thermal expansion (CTEs) of the materials that make up the substrate.
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