发明授权
US08675177B2 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
有权
曝光方法和装置，以及在第一和第二对区域中具有较大光量的光量分布的装置的制造方法
- 专利标题： Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
- 专利标题（中）： 曝光方法和装置，以及在第一和第二对区域中具有较大光量的光量分布的装置的制造方法
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申请号： US11902277申请日： 2007-09-20
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公开(公告)号： US08675177B2公开(公告)日： 2014-03-18
- 发明人: Takehito Kudo , Shigeru Hirukawa
- 申请人： Takehito Kudo , Shigeru Hirukawa
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2003-105920 20030409; JP2003-299628 20030825; JP2003-307806 20030829; JP2003-329194 20030919; JP2003-329309 20030922
- 主分类号： G03B27/72
- IPC分类号： G03B27/72
摘要：
An exposure method and apparatus simultaneously transfer patterns with various pitches with high resolution. On the pupil surface of an illumination system, at least first and second pairs of areas are set. The distribution of intensity of light over the pupil surface is set so that the intensities of light of the second pair of areas is smaller than that of the first pair of areas.
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