Invention Grant
- Patent Title: Method for manufacturing photomask and photomask manufactured using the same
- Patent Title (中): 制造使用其制造光掩模和光掩模的方法
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Application No.: US13571043Application Date: 2012-08-09
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Publication No.: US08673522B2Publication Date: 2014-03-18
- Inventor: Jin Choi , Byung-Gook Kim , Hee-Bom Kim , Sang-Hee Lee
- Applicant: Jin Choi , Byung-Gook Kim , Hee-Bom Kim , Sang-Hee Lee
- Applicant Address: KR Suwon-Si, Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2011-0128563 20111202
- Main IPC: G03F1/38
- IPC: G03F1/38
Abstract:
A method for manufacturing a photomask includes forming a photoresist film on a substrate, and forming a defect detecting pattern on the photoresist film. The defect detecting pattern has a first pattern elongated in a first direction and a second pattern overlapping one end of the first pattern and elongated in a second direction different from the first direction. The first pattern and the second pattern are formed using electron beams (e-beam) diffracted by a same amplifier.
Public/Granted literature
- US20130143150A1 METHOD FOR MANUFACTURING PHOTOMASK AND PHOTOMASK MANUFACTURED USING THE SAME Public/Granted day:2013-06-06
Information query
